Spectroscopic ellipsometry specialist Horiba Scientific has launched new Uvisel Plus, a modular ellipsometer that includes the newest acquisition technology designed to measure thin-film samples faster and more accurately.
FastAcq, the newest acquisition technology, is based on double modulation designed for real-world thin-film characterization. Based on a new electronic data processing and high-speed monochromator, the new FastAcq technology enables a sample measurement from 190 to 2100 nm to be completed within three minutes, at high resolution. The possibility to continuously adjust the spectral resolution along the measurement range enables to scan a sample smarter and faster. The Uvisel Plus also introduces a new calibration procedure, delivering faster performance and accuracy.
Thanks to its design, which has no rotating elements and no additional components in the optical path, Horiba’s Uvisel Series phase modulation technology delivers pure and efficient polarization modulation for accurate ellipsometric parameter measurements. The polarization modulation capabilities of the photoelastic modulator deliver the highest sensitivity for measurement of critical thin, transparent layers deposited onto glass substrates.
Designed for flexibility with thin-film measurements, the Uvisel Plus offers microspots for patterned samples down to 50 µm, variable angle from 40 to 90°, an automatic horizontal mapping stage and a variety of accessories, making it scalable to meet various needs. The spectral range from 190 to 2100 nm is covered by only two Uvisel Plus configurations: 190–920 nm and a NIR extension up to 2100 nm. Uvisel Plus can be upgraded to adjust to changing needs in the future. Driven by the DeltaPsi2 software platform as well as the Auto-Soft interface, which features an intuitive workflow to speed up data collection and analysis, the Uvisel Plus allows users from novice to expert to perform thin-film measurements with accuracy and sensitivity.
The Uvisel Plus with its FastAcq technology is a spectroscopic ellipsometer for thin-film thickness and optical constant measurements in the fields of materials research and processing, flat panel displays, microelectronics and photovoltaics.
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