KLA-Tencor FlashScan Inspects Optical and EUV Reticle Blanks

Published on 16 August 2017

Leveraging laser scattering technology from KLA-Tencor's wafer defect inspection portfolio, the FlashScan systems meet sensitivity and speed requirements for all optical and EUV blanks currently in production or development. The three-channel collector, unique in the reticle inspection market, is designed to detect, size and discriminate among various types of reticle blank defects, such as pinholes in photoresist and fall-on particles that may appear during blank manufacturing or shipping.

Strong customer interest from leading mask shops testifies to the market's need for a high sensitivity, high productivity system promising the full range of defect type capture. To maintain the high performance and productivity demanded by blank and patterned reticle manufacturers, FlashScan systems are backed by KLA-Tencor's global comprehensive service network. More information about the new FlashScan product line, including a description of current models, can be found on the FlashScan web page.