Polymicro Technologies, a subsidiary of Molex Incorporated, will showcase the recently announced improvements to its fibre-optic distribution panel (FDP) optical fibre at the SPIE Photonics West 2014 conference, which runs on 1-6 February at the Moscone Center (booth 8323) in San Francisco, California (US). The latest enhancements improve solarisation resistance of the fibre in deep ultraviolet (UV) applications (190 nanometres [nm] to 325nm). In addition, John Shannon, engineering manager, will present a technical paper along with Valery Khalilov, product development senior engineer, and Richard Timmerman, senior test engineer, on “Improved Deep UV Optical Fibre for Medical and Spectroscopy Applications,” Saturday, 1 February at 11:30 a.m. to 11:50 a.m. Pacific Standard Time (PST) at BiOS, part of Photonics West at the Moscone Center.
Polymicro silica core optical FDP fibre features ultrahigh UV transmission and ultralow UV solarisation, with radiation resistance. Operating down to 190nm with deep UV solarisation resistance characteristics, FDP fibre has become a fibre of choice for applications in the deep UV region, according to the company. The new FDP fibre delivers greater solarisation resistance to sustain transmission longer, while minimising damage to the fibre.
For applications in the deep UV region, the effects of high levels of UV radiation cause fibre and transmission deterioration. Fibres typically lose transmission after several hours.
Delivering dimensional control and tight tolerances, Polymicro FDP optical fibres offer a range of options, including custom core sizes, coatings, buffers and assemblies. Molex and Polymicro facilities are ISO 9001, 13485 and 14001 certified.
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